High density oxygen plasma ashing of CVD-diamond coating with minimum damage to WC (Co) tool substrates
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چکیده
منابع مشابه
Murakami and H2SO4/H2O2 Pretreatment of WC-Co Hard Metal Substrates to Increase the Adhesion of CVD Diamond Coatings
Distinct improvement in adhesion of diamond coatings on hard metal substrates was achieved by following substrate surface pretreatment [I]: First WC was removed from the substrate surface by etching with Murakami solution (K3[Fe(CN)6] in KOH), after which the Co binder network was etched with H2S04/H202 solution. Then diamond coatings were deposited on the substrates by hot-filament CVD. Appare...
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Thin films of boron nitride have been obtained by reactive pulsed laser ablation of a boron target in the presence of a 13.56 MHz radio frequency nitrogen plasma. The films have been deposited at several substrate temperatures, using the on-axis configuration, on WC–Co cutting tools, after Co removal by chemical etching (HClyHNO or HFyHNO ). Diamond polycrystalline 3 3 films of increasing thick...
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ژورنال
عنوان ژورنال: Mechanical Engineering Journal
سال: 2016
ISSN: 2187-9745
DOI: 10.1299/mej.15-00533